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Magnetron sputtering PP based zinc copper oxide layerA zinc copper oxide layer was prepared on a PP substrate using magnetron sputtering. The deposition rate, composition, morphology, and crystal structure of the zinc copper oxide layer were controlled by changing the sputtering pressure and power. The growth rate and crystal structure of the zinc copper oxide layer were studied under different sputtering powers and pressures, and the sputtering conditions were optimized.
(1) Systematically studied the effects of sputtering power and sputtering time on the growth rate and crystal structure of zinc copper oxide layers.
(2) By analyzing the copper phase ratio and metal bonding mode in the zinc copper oxide layer, the relationship between deposition rate, crystal structure, and sputtering conditions was summarized.
(3) The distribution of copper phase in the visible light range of zinc copper oxide layer was observed using transmission electron microscopy, and the influence of copper content in the film on crystal structure, morphology, and light absorption characteristics was discussed.
(4) The surface morphology of the deposited zinc copper oxide layer was observed using atomic force microscopy, and the effects of deposition rate, sputtering power, and sputtering pressure on the surface roughness of the zinc copper oxide layer were discussed.
(5) The oxygen content in the zinc copper oxide layer was measured using an X-ray diffractometer, and the distribution of copper phase on the surface of the film in the visible light range was analyzed by measuring the oxygen content.
(6) The resistivity of the zinc copper oxide layer was measured using a four probe resistance tester, and it was found that the copper phase content was an important factor affecting the resistivity of the zinc copper oxide layer. Sputtering power and sputtering pressure were also important factors affecting the copper phase content.
(7) Measure the sample's response to visible light in the 475 nm wavelength band using a UV visible spectrophotometer, observe the sample's response to infrared light in the 475 nm wavelength band using a scanning electron microscope, and observe the sample's absorption characteristics of infrared light in the 475 nm wavelength band at different temperatures.
Magnetron sputtering PP based zinc copper oxide layerIt is a new type of high-performance composite material composed of PP substrate and zinc copper oxide layer. It is a thin film formed on the surface of PP substrate by magnetron sputtering technology. It has excellent heat resistance, corrosion resistance, and arc resistance, and is therefore widely used in the packaging of electronic devices, chip packaging, and sensor manufacturing. The production process of magnetron sputtering PP based zinc copper oxide layer is to first treat the surface of the PP substrate, and then use magnetron sputtering technology to sputter a layer of zinc copper oxide film on the surface of the PP substrate, forming the final magnetron sputtered PP based zinc copper oxide layer. Magnetron sputtering PP based zinc copper oxide layer has excellent thermal stability, which can effectively resist the effects of high and low temperatures, suppress the deformation and damage of electronic components, and thus improve the reliability of electronic components.
In addition, the magnetron sputtered PP based zinc copper oxide layer also has good corrosion resistance, which can effectively prevent corrosion of the metal surface and significantly improve the service life of electronic components. In addition, the magnetron sputtered PP based zinc copper oxide layer also has good conductivity, which can effectively reduce the resistance of electronic components, improve the working efficiency of electronic components, and thus enhance the efficiency of electronic components.
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