The resistivity can reach 10-4 Ω· cm, and the ITO transparent conductive film glass has high hardness, wear resistance, and chemical corrosion resistance

There are many types of transparent conductive films, but the one with practical application value is still dominated by oxide films, such as indium tin oxide films（Indium-Tin-Oxide, abbreviated asITOThin film),ITOTransparent conductive film is deposited on the surface of a substrate by physical or chemical methods. The substrate material is generally ultra-thin glass, so it is also known asITOTransparent conductive film glass.

ITOTransparent conductive film glass is internationally recognized70A new type of material developed in the early 2000s, belonging to the widely used electrical and electronic glass family in the information industry, holds an important position in the information industry. Transparent conductive film glass, as an upstream product in the flat display industry, has a wide range of applications, includingLCDThe key components in LCD displays can also be used as transparent glass electrodes in other high-end flat panel displays, and are closely related to consumer products such as building materials, automobiles, televisions, etc. Its process can be further extended to the production of any conductive glass required by the market.

Transparent conductive films have the following characteristics:

◾ Good conductivity, with a resistivity of up to10－4Ω﹒cm；

◾ High hardness, wear resistance, and chemical corrosion resistance;

◾ Good processing performance;

◾ High visible light transmittance, up to85%Above;

◾ Has good absorption of ultraviolet rays, with an absorption rate not less than85％；

◾ Has good reflectivity for infrared radiation, with a reflectivity of not less than80％；

◾ Has attenuation properties for microwaves, with an attenuation rate not less than85%.

ITOThere are three essential conditions for the production of transparent conductive film glass, namely: coating equipmentITOTarget material and transparent ultra-thin glass（0.4－1.3mm）.ITOThe preparation of transparent conductive films is the core technology of the process, which can be achieved through various methods, including magnetron sputtering (DC magnetron sputtering and RF magnetron sputtering), vacuum evaporation (resistance heating or electric beam heating), immersion method, chemical vapor deposition method, spray coating method, etc5Planting techniques. The currently widely used method is direct current magnetron sputtering, which is used for continuous platingITOThe film layer has many advantages, such as uniform film thickness, easy control, good film repeatability, stability, suitable for dry continuous production, large-area plating, arbitrary placement of the substrate and target according to ideal design, the ability to produce dense thin film layers at low temperatures, the ability to use alloy target reactive sputtering, and the ability to use oxidation target direct sputtering. This process is suitable for large-scale industrial production,ITOTransparent conductive film glass has good quality, a wide variety of specifications, and low energy consumption.

Firstly, prepare the specified thickness dimensions（0.4－1.3mm）Ultra thin glass sheet, pre treated with water washing and ultrasonic cleaning, enters the vacuum chamber and is first subjected toSiO2Plating, then enteringITOCoating room platingITOThe film is heated, cured, and annealed to obtain the finished product.ITOThe entire process of conductive film glass is clean and dust-free under high vacuum conditionsAr(Argon) andO2(Oxygen) gas is deposited on the surface of a glass substrate by magnetron sputtering, followed by heating and annealing to produce a thin film of steel tin oxide.