Magnetron sputtering low-temperature deposition of ITO thin film is a method for preparing transparent conductive thin films. Among them, ITO refers to Indium Tin Oxide.
This method utilizes magnetron sputtering technology to sputter atoms from ITO (steel tin oxide) target material onto the substrate surface, forming a thin film. Low temperature deposition refers to the process of depositing at lower temperatures, typically at room temperature or slightly higher temperatures.
Magnetron sputtering is a physical vapor deposition technique that utilizes a magnetic field to control ion trajectories, enabling the preparation of high-quality thin films. In this method, metal indium and tin targets are placed in a vacuum chamber and excited by arc discharge or radio frequency power to generate high-energy ion beams. These ion beams collide with the surface of the target material, sputtering it out and depositing it on the substrate surface to form a thin film.
This technology uses magnetron sputtering equipment to sputter ITO targets, and by controlling parameters such as temperature, pressure, volume type, and flow rate, ITO thin films with desired properties can be prepared on substrates.
Among them, low-temperature deposition technology is a new method for preparing ITO thin films, which mainly uses high-power pulse power to quickly increase the temperature of the ITO target material, thereby achieving the preparation of ITO thin films at lower substrate temperatures. This method can avoid the influence of heat on the substrate and achieve precise control over the quality and performance of the thin film.
Therefore, the magnetron sputtering low-temperature deposition ITO film technology has the advantages of simple, efficient, and highly controllable preparation of ITO films, and is widely used in the manufacturing of electrical devices such as touch screens and liquid crystal panels.
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